Nanostructure Thin Films Prepared by Using PLD and SILAR Method
There are several types of binary, ternary and quaternary thin films have been prepared using pulsed laser deposition (PLD) and successive ion layer adsorption and reaction (SILAR) method. These methods have many advantages such as able to control the dimensions, the growth rate, film thickness and produce nano-particles. In this work, PLD and SILAR methods were briefly discussed. Experimental results for the films prepared using these two deposition techniques from literature review will be described. Characterization of thin films using various tools (SEM, EDAX, XRD, XPS, FTIR, UV-Visible spectrophotometer, Raman Spectra) showed these deposition techniques were suitable to prepare metal chalcogenide thin films.
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