There are many nanostructured thin films (such as binary and ternary compounds) have been prepared using simple chemical bath deposition technique. These films were deposited onto various substrates under different experimental conditions. During the deposition process, complexing agent will be added to improve quality of films. In this work, an analysis was carried out to investigate the growth of films in the presence of complexing agent. Researchers conclude that complexing agent controls cation ions during the deposition process. Aa a result, can produce uniform surface and control deposition rate as well.
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